磁控溅射法沉积TCO薄膜的电源技术

学版)，2003，35(4)：37～40.

[5] 徐成海，陆峰，谢元华.氧化锌铝透明导电膜[J].真空电子技术，2003，(6)：39～44.

[6] 徐万劲.磁控溅射技术进展及应用(上)[J].现代仪器，2005，(5)：1～5.

[7] Brauer G., Szyszka B, Vergohl M. Magnetron sputtering-Milestones of 30 year[J]. Vacuum，2010，84：1354–1359.

[8] Takikawa H, Tanoue H. Review of cathodic arc deposition for preparing droplet-free thin films [J]. Plasma Science, IEEE Transactions on, 2007, 35(4): 992～999.

[9] Christou C, Barber Z.H. Ionization of sputtered material in a planar

magnetron discharge [J]. Journal of Vacuum Science Technology A, 2000, 18(6): 2897～2908.

[10] Helmersson U, Lattemann M, Bohlmark J, et al. Ionized physical vapor deposition

(IPVD): A review of technology and applications [J]. Thin Solid Films, 2006, 513(1):1～24.

[11] 陈侃松，顾豪爽，孙奉娄等.一种新型的中频交流等离子体电源[J].电路与系统学报.2006， 1l(4)：78～81.

[12] 陈文光.脉冲溅射电源设计[J].机械加工与自动化,2004，(4)：8～11.

[13] Ochs D, Rettich T. SVC 51th Annual Technical Conference Proceedings SVC (2008).

[14] Ochs D. New Features of DC Power Supplies for TCO Magnetron Sputtering [J]. OTTI Thin

Films Photovoltaic Conference 2009.

[15] Kouznetsov V, Macak K, Schneider J.M, et al. A novel pulsed magnetron sputter techni

queutilizing very high target power densities [J]. Surface and coatings technology, 1999, 1222):

290～293.

[16] Bugaev S.P, Koval N.N, Sochugov N.S, et al. Investigation of a highcurrent pulsed

magnetron discharge initiated in the low-pressure diffuse arc plasm

[J]. XVIIth International Symposium on Discharges and Electrical Insulation in Vacuum, 1996,

2:1074～1076.

[17] Fetisov I.K, Filippov A.A, Khodachenko G.V. Impulse irradiation plasma technology for

filmdeposition [J]. Vacuum, 1999, 53(1):133～136.

[18] Helmersson U, Lattemann M, Bohlmark J. Ionized physical vapor deposition (IPVD):

A review of technology and applications [J]. Thin Solid Films, 2006, 513(1):1～24.

[19] Christie D.J, Tomasel F., Sproul W.D. Power supply with arc handling for

high peak power magnetron sputtering [J].Journal of Vacuum Science Technology A: Vacuum,

Surfaces, and Films, 2004, 22(4):1415～1420.

[20] Ganciu M, Konstantinidis S, Paint Y. Preionised pulsed magnetron discharges for

ionised physical vapour deposition [J]. Journal of Optoelectronics and Advanced Materials,

2005, 7(5):2481～2484.

[21] Musil J, Lestina J, Vlcek J. Pulsed dc magnetron discharge for highrate sputtering

of thin films [J]. Journal of Vacuum Science Technology A: Vacuum, Surfaces, and Films,

2001, 19(2): 420～424.

[22] Sittinger V, Ruske F, Werner W. High power pulsed magnetron sputtering of transparent

conducting oxides [J]. Thin Solid Films, 2008, 516(17): 5847～5859.■