silvaco光刻问题···求助

go athena
set lay_left=-0.5
set lay_right=0.5
#
illumination g.line
illum.filter clear.fil circle sigma=0.38
#
projection na=.54
pupil.filter clear.fil circle
layout lay.clear x.lo=-2 z.lo=-3 x.hi=$lay_left z.hi=3
layoutx.lo=$lay_right z.lo=-3 x.hi=2 z.hi=3
image clear win.x.lo=-1 win.z.lo=-0.5 win.x.hi=1 win.z.hi=0.5 dx=0.05 one.d
structure outfile=mask.str intensity mask
tonyplot mask.str
line x loc=-2spac=0.05
line x loc=0spac=0.05
line x loc=2spac=0.05
line y loc=0spac=0.05
line y loc=2spac=0.2
init silicon orient=100 c.boron=1e15 two.d
deposit nitride thick=0.035 div=5
deposit name.resist=AZ1350J thick=.8 divisions=30
rate.dev name.resist=AZ1350J i.line c.dill=0.018
structure outfile=preoptolith.str
tonyplot preoptolith.str
exposedose=240.0 num.refl=10
bake time=30 temp=100
develop kim time=60 steps=6 substeps=24
structure outfile=optolith.str
tonyplot optolith.str

运行上述程序到标红处就运行不了，显示
The structure has been deleted. The program cannot continue.
是怎莫回事，求助！